Recent Patents on Nanotechnology Impact Factor, Quartile, Indexing, Ranking

Recent Patents on Nanotechnology Impact Factor, Indexing, Ranking

Recent Patents on Nanotechnology (RPN) is a scholarly journal dedicated to publishing research in the field of Physics and Astronomy, and Published by Bentham Science Publishers. The Print-ISSN of Recent Patents on Nanotechnology is 18722105


Recent Patents on Nanotechnology Aim and Scope

Recent Patents on Nanotechnology is published by Bentham Science Publishers, publishing since 2007. It covers research in Physics and Astronomy, Materials Science, Engineering.

The journal is indexed in Scopus.


Recent Patents on Nanotechnology Details


Journal title Recent Patents on Nanotechnology (RPN)
Print ISSN18722105
Online ISSN22124020
Publisher Name Bentham Science Publishers
Subject Category Physics and Astronomy
Access type 🔒 Subscription
Status 🟢 Active

Recent Patents on Nanotechnology Metrics and Rankings

In the context of academic journals, "Metrics and Rankings" refer to various measures and evaluations used to assess the quality, influence, and impact of a journal.

Below are the metrics and rankings for the journal Recent Patents on Nanotechnology


Recent Patents on Nanotechnology Abstracting and Indexing

Abstracting and Indexing (A&I) refers to the processes that help organize and categorize academic journals, making them easier to find and access for researchers and scholars

Abstracting and Indexing

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